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1. Katsuya TESHIMA*, Yasushi INOUE, Hiroyuki SUGIMURA, Osamu TAKAI:
   Room-temperature deposition of high-purity silicon oxide films by RF plasma-enhanced CVD;
   Surface and Coatings Technology, 146-147, 451-456 (2001)
2. Katsuya TESHIMA*, Yasushi INOUE, Hiroyuki SUGIMURA, Osamu TAKAI:
   Reduction of carbon impurities in silicon oxide films prepared by rf plasma-enhanced CVD;
   Thin Solid Films, 390, 88-92 (2001)