WORK
Dissertation
2002
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手嶋　(論文：5)

論文
  1. Katsuya TESHIMA*, Yasushi INOUE, Hiroyuki SUGIMURA, Osamu TAKAI:
    Growth and structure of silica films deposited on a polymeric material by plasma-enhanced chemical vapor deposition;
    Thin Solid Films, 420-421, 324-329 (2002)
  2. Katsuya TESHIMA*, Yasushi INOUE, Hiroyuki SUGIMURA, Osamu TAKAI:
    Transparent silica films deposited by low-temperature plasma-enhanced CVD using hexamethyldisiloxane;
    Chemical Vapor Deposition, 8, 251-253 (2002)
  3. Katsuya TESHIMA*, Yasushi INOUE, Hiroyuki SUGIMURA, Osamu TAKAI:
    Gas barrier properties of silicon oxide films prepared by plasma-enhanced CVD using tetramethoxysilane;
    Vacuum, 66, 353-357 (2002)
  4. 手嶋勝弥*，青柳誠，彦坂眞一：
    トリメリット酸無水物のマイクロカプセルトナーの帯電安定性；
    日本化学会誌, 169-173 (2002)
  5. 手嶋勝弥*，彦坂眞一：
    トリメリット酸無水物のマイクロカプセルトナー；
    日本化学会誌, 63-66 (2002)